Application of Focused Ion beam in Advanced Photovoltaic
A lot of exciting ideas are followed by scientists and researchers all around the world on advanced photovoltaics searching for new solution in photoconversion, light trapping and novel collecting structures the so called “field of dreams where the research concepts and technology require the PV researchers’s creativity, patience and funding to prove or develop concepts”.
Focused ion beam (FIB), is a well established technique used particularly in the semiconductor industry, materials science and biological field for specific analysis, deposition, and ablation of materials can represent a very useful “ab inizio” technique to prove in very short time new concepts on advanced photovoltaics before making investment in their further development and searching for cost effective solution.
Useful information
Focused ion beam (FIB), is a well established technique used particularly in the semiconductor industry, materials science and biological field for specific analysis, deposition, and ablation of materials. Its operating mechanism relies on a highly focused and energetic gallium ion beam that hits the surface of the substrate for machining materials at nanoscale and to make very accurate cross section of a sample/devices for SEM, STEM or TEM applications.
FIB is also finding very wide application for rapid processing and prototyping of nano-scale devices with very high reproducibility and flexibility. FIB can also represent a very useful “ab inizio” technique to prove in very short time new concepts on advanced photovoltaics before making investment in their further development and searching for cost effective solution.
The webinar is divided into two parts
Agenda
Time | Title | Speakers |
---|---|---|
11:00-11:30 | Introduction to FIB-Focussed Ion Beam | LA FERRARA Vera |
11:30-12:00 | TCO and ARC Nanopatterning by FIB | NENNA Giuseppe |
Details
Introduction to FIB-Focussed Ion Beam
Speakers : LA FERRARA Vera
In the first part of webinar the technique has been presented ny Vera LA FERRARA in order to show its peculiarity and potential for technical-scientific application in sample preparation and for advanced materials preparation.
TCO and ARC Nanopatterning by FIB
Speakers : NENNA Giuseppe
In the second part it has been presented by Giuseppe NENNA the potential of technique in realizing nanopatterning of existing materials like TCO and doped SiO2 dielectric layers photonic crystal (PC) structure by using electron beam lithography (EBL) and focused ion beam (FIB) techniques to improve light trapping efficiency and on to obtain high refractive index grid anode directly on the substrate